Low cost UV-Ozone for ultimate cleaning of substrates
The first step of fabrication of solar cell is surface cleaning of substrate that is very time consuming procedure. Conventional cleaning techniques often don’t remove molecular levels of contamination and the residual of cleaning solvents remain on the surface. The contamination have negative effects on further layer depositions and electrical characteristics of solar cells.
The ultraviolet (UV)/ozone cleaning is a simple-to-use, inexpensive, fast and dry method that rapidly removes a variety of contaminants from surfaces. The contaminants which were successfully removed include oils and greases (including silicones), fluxes, skin oils, and contamination adsorbed during prolonged exposure to air. Contact angle measurements and wettability tests confirm the performance of this method.
In this method samples is exposed to significant dose of simultaneous UV/ozone, at optimum and controlled conditions. Also, oxygen can diffuse in to the system and exposure time for UV-ozone can be controlled using a timer.
APPLICATIONS:
-Prior to thin film deposition on many surfaces
-Cleaning of silicon, GaAs and InP wafers, optical lens, mirrors, solar panels, steel sheets
-Hybrid substrates prior to wire bonding – removal of condensed epoxy volatiles
-Improved adhesion to plastic surfaces
-Creating thin oxide on Silicon wafers
-OLEDs; and so on
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Technical Specifications |
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Model |
UZ-1927 |
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UV lamp type |
Low pressure mercury quartz UV Lamp |
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UV lamp dominant wavelengths |
185 nm, 254 nm |
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UV lamp dimensions |
10 cm × 19 cm |
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Light induced ozone generator 220V 20W |
220 V , 20 W |
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Power supply |
220 V , 0.5 A |
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Max run time |
99 hours |
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Safety features |
Exhaust fan, electrical fuse |
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Substrate tray size |
19 cm × 26 cm |
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Maximum recommended substrate size |
18 cm × 25 cm × 1 cm |
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Dimensions (WxHxD) |
40 cm × 30 cm × 40 cm |